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THIN FILM SOLAR CELL LASER SCRIBING SYSTEMS

Thin Film Solar Cell Laser Etching Systems for Thin Film Solar Cell manufacturing is equipped with a 532nm/1064nm high power laser. The system can efficiently and accurately etch different thin films on glass substrates. The systems is highly reliable with low operating cost. Customized functionalities and features can be made available on requests. Features: 1. X-Y-Z three-dimensional adjustment 2. CCD assisted automatic positioning 3. Dust collecting system 4. Laser protecting system 5. Laser beam stabilization system 6. Friendly operating interface, real-time display of etching paths Advantages: 1. Simple operation, few processing steps 2. Reliable and high production capability 3. A lager etching rang width 4. High processing speed Applicable Films: -- A-Si -- CIS/CIGS -- CdTe Specifications: Glass substrate size: 1100mmX1400mm Approx. Productivity: 3min/pcs(with two laser beams) Max etching speed: 1000mm/s Bearing weight: 150Kg Repositioning accuracy: +/-0.01mm Focal length: F=100-200mm Wavelength: 1064nm/532nm Exhaust system: Φ150 Air compressor: Up to 0.4Mpa 200L/min Power supply: 3 phase 380V/40A System dimension: L3800mm*W1700mm*H2000mm

YVO4 CRYSTAL

Pure YVO4 crystal is a positive uniaxial crystal with a wide transparency range in IR, a large birefringence, and excellent mechanical properties. It has been widely used in fabricating polarizers, fiber optic isolators, circulators, and beam displacers.

ACHROMATIC LENSES

Achromat consists of a positive low-index Crown Glass lens element cemented to a negative high-index Flint Glass lens element. The elements are chosen so as to cancel chromatic aberration at two well-separated wavelengths, usually in the blue and red region of the spectrum. Focal length is constant at those two wavelengths and focal length shifts are virtually eliminated across the visible wavelengths. One frequent use is to achieve diffraction limited focusing of a laser beam. Negative Achromat is typically used when there is a need to eliminate chromatic aberration. In addition to reducing chromatic aberration at the design wavelengths, spherical aberration and coma are greatly reduced.

KTP CRYSTAL

KTP (Potassium Titanyl Phosphate, KTiOPO4)KTP has many favorable features that enable it to be widely used for frequency mixing for Red/Green/Blue output, and for OPO and OPA for visible to mid-infrared tunable output. It is also used for many E-O devices such as optical waveguides, optical switches, directional couplers and E-O modulators.KTP Crystal has the following exceptional properties that make it a very important nonlinear crystal: Large nonlinear optical coefficientWide angular bandwidth and small walk-off angleBroad temperature and spectral bandwidth High electro-optic coefficient and low dielectric constant Large figure of merit Nonhydroscopic, chemically and mechanically stable High thermal conductivity Low cost compare with BBO and LBO KTP is a positive biaxial crystal, with the principal axes X, Y, and Z (nz>ny>nx) parallel to the crystallographic axes a, b, and c, respectively.

BBO CRYSTALS

Beta-Barium Borate (β-BaB2O4,BBO) Lasertec BBO crystal is grown with CZ technology. CZ method grown BBO is better than usual Flux grown BBO with better homogeneity,no inclusion and lower defects. The better internal quality of BBO is important as it has lower absorption,higher damage threshold,an dbetter laser performance. Lasertec supplies crystal length from 0.01 to 20mm with various aperture and coating.Lasertec BBO is featured by ã€€ Broad phase matchable range from 410 nm to 3500 nm; Wide transmission region from 190 nm to 3500 nm; Large effective second-harmonic-generation (SHG) coefficient about 6 times greater than that of KDP crystal; High damage threshold of 10 GW/cm2 for 100ps pulse-width at 1064nm; High optical homogeneity with dn » 10-6/cm; Wide temperature-bandwidth of about 55°C.

NDGLASS

Nd doped phosphate glass have been widely used in high average power laser solid state lasers，laser material processing, range finder and other industrial and scientific applications。 Lasertec's mainly offers two types of Nd 3+ doped phosphate glasses－N21and N31. Lasertec's Nd 3+ phosphate glasses are guaranteed in optical qualities such as homogeneity, striation, stress birefringence, Pt inclusions etc. The different neodymium doping phosphate glasses are ready for your quest. We have stocked 0.7%, 3.0%, and 4.0% doped N31 and N21. N21- an Nd 3+ : phosphate glass is specially developed for the LF1 # and LF2 # Laser Facility. It consist of two high power laser beams at 1.054um, each has an output aperture of 200mm with output power of 10 12 W. Its operation represents a significant achievement of laser technology in China. This kind of glass exhibits the moderate cross section for stimulated emission and the excellent chemical durability. N31－a new Nd 3+ : phosphate glass is specially developed for the LF12 # Laser Facility－at present the most powerful laser facility in China（also called “Shengguang” in SIOM of China）It exhibits the nearly same qualification with HOYA LHG8.

ER:GLASS

Erbium and ytterbium co-doped phosphate glass has a broad application because of the excellent properties. Mostly, it is the best glass material for 1.54um laser due to its eyesafe wavelength of 1540 nm and high transmission through atmosphere. It's also suitable for medical applications where the need for eye protection may be difficult to manage or diminish or hinder essential visual observation. Recently it is used in optical fiber communication instead of EDFA for its more super plus. There is a great progress in this field. We can also produce erbium laser glass with various ions doping according to your requirement. We have three kinds of Erbium-doped glasses for different use, WM4, Cr14 and EAT14. WM4: Erbium phosphate glass for ion-exchange purpose; Cr14: Erbium phosphate glass for xenon lamp pumping laser device and laser range-finder EAT14: Yb 3+ , Er 3+ co-doped phosphate glass, which is applicable in high repetition rate (1-6Hz) laser diode pumped 1535nm laser. High Yb 3+ doping can be realized to this EAT14 glass.

THIN-FILM SOLAR CELL LASER EDGE DELETION SYSTEM

Compared with the traditional technics, this Thin-Film Solar Cell Laser Edge Deletion System delivers excellent performance with more efficiency, higher precision, and zero damages to the glass substrate. Additionally, the special dusting system avoids the secondary pollution of the traditional sand blast process.

UV LASER WAFER SCRIBING SYSTEMS

UltraScriber is a high precision laser system developed by Delphi Laser, specifically to support LED chip manufacturing. Substrates, such as Sapphire, Copper, Silicon, Cobalt as well as Alloy, can be scribed with high precision. This system has a very good quality and can achieve high throughput(10 pcs/hr) with long time reliabiltiy. UltraScriber has won much good reputation among customers, and is accepted widely in the LED industrial.TripleScriber is another UV laser scribing system which is sepecially developed for scribing small size chips with high throughput.Features• 4 Dimentional high precision adjust system for position • 3 Co-Axial CCD image indentifying system • Real-time monitoring for laser power • Powerful vision system for anti-roughness on chip surface• High stability shock-proof system with granite• Process memory systemApplication Materials Sapphire, Ceramic, Quartz, Diamond, Silicon as well as Copper, Cobalt, and many AlloysApplicationsLED and other wafer production industriesSpecifications UltraScriber / TripleScriberChip Size ≥ 6 milScribing Depth 22-45 umBeam Number Single / ThreeRotation Stage ±7°with 0.0001°Res.X-Y axis resolution 0.1 umZ axis resolution 1 umThroughput > 15pcs/h @ 14 mil

UV LASER PRECISION MICRO MACHINING SYSTEM

With strong technical capability and process experience, delphilaser successful developed a new generation high-end laser system. This system delivers high performance in cutting, drilling and surface treatment in glass, Ceramic, Sapphire, Silicon, Cu, Alloys and organic films with high throughput, good quality and flexibility. Specifications:Wavelength : 355nm Pulse width : 8-15ns Average power : 3W6W8W Pulse energy stability : <3%rms Maximum aspect ratio : 4:1 Minimum diameter : 70um Features : 1. High efficiency, high stability 2. Small thermal effect, excellent in shape 3. Suitable for a variety of graphics formats 4. High density drilling Applications : Main applications in micro-drilling, cutting on glass, Ceramic, Sapphire, Silicon, Cu, Alloys and organic films, especially on hard and brittle materials such as glass, Ceramic, Sapphire,etc.