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Read full testimonial »Aix G5 Ht
AIXTRON SE >>
Description
The AIX G5 HT Metal Organic Chemical Vapor Phase Deposition system is based on AIXTRON\'s proprietary Planetary Reactor concept. To be used for the deposition of Gallium Nitride materials. The Next Generation Platform AIX G5 HT provides the largest wafer capacity (56x2” / 14x4” / 8x6”) and comes with revolutionary new reactor design features that allow high growth rates and consecutive runs without baking or swapping of parts. The new reactor design provides highest process flexibility combined with superior process stability.
| Product line: | Optical Manufacturing and Design |
|---|---|
| Subcategories: | Chemical Vapor Deposition Equipment |
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