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Testimonials
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Read full testimonial »Orion Iii: Plasma Enhanced Chemical Vapor Deposition (pecvd) System
Trion Technology >>
Description
The Orion III PECVD system produces production-quality films on a compact platform. The unique reactor design produces low stress films with excellent step coverage at extremely low power levels. The system meets all safety, facility and process requirements within the laboratory and pilot line production environments. The Orion III has many standard features not typically found on a system so reasonably priced, which is why many users worldwide have made it their PECVD system of choice.
Applications: MEMS, Solid State Lighting, Failure Analysis, Research & Development, Pilot Line.
For processes, features and options visit: http://www.triontech.com/orion.htm
For applications visit: http://www.triontech.com/applications.htm
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