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Read full testimonial »Phantom Iii: Reactive Ion Etch (rie) System
Trion Technology >>
Description
The Phantom III RIE is designed to supply research and failure analysis laboratories with state-of-the-art plasma etch capability using single wafers, dies or parts using fluorine and oxygen based chemistries. The system has a compact, modular design built on a space-saving platform."Frankly, the Phantom has been a GREAT machine since I have been a user. For this machine that has been at least 10 years. This Phantom was purchased originally by Philips where I used to work. The Phantom has followed me to Sipex and now Exar. I can't imagine living without it. It has been one of the best made and reliable plasma etchers I have used in my over 20-year career." - Don Breedlove, Failure Analysis Engineer, Exar Corporation. Applications: MEMS, Solid State Lighting, Failure Analysis, Research & Development, Pilot Line.For etch processes, features and options visit: http://www.triontech.com/phantom.htm For applications visit: http://www.triontech.com/applications.htm
| Product line: | Optical Manufacturing and Design |
|---|---|
| Subcategories: | Etching Equipment | Machine Design | MEMS | Optical Manufacturing Tools and Machinery | Plasma Cleaning Equipment | Plasma Etchers | Semiconductor Assembly Equipment | Vacuum Chambers |
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