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Testimonials
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Read full testimonial »| Etching Equipment
The Oracle III is the smallest and most flexible full production cluster system on the market. The system consists of a central vacuum transport (CVT), vacuum cassette elevators and up to four process reactors. These process reactors are docked to th...
Trion Technology
The Gemini is the most compact, inexpensive and versatile system, which can handle 100-300mm wafers. This multi-chamber, high throughput stripping system is designed specifically for the demands of today's production fabs. By employing ICP, microwave...
Trion Technology
A very compact, fully automated, vacuum loadlocked plasma system for semi-conductor production. Available in either Reactive Ion Etch (RIE) configuration, High Density Inductive Coupled Plasma (HDICP) or Plasma Enhanced Chemical Vapor Deposition (PEC...
Trion Technology
The cost of new stripping systems has escalated to unreasonable levels. Trion has solved this critical problem. The Apollo is a compact, inexpensive and versatile system, which can handle 100-300mm wafers. By employing either ICP or microwave and RF ...
Trion Technology
Trion Technology presents the Sirus T2 Reactive Ion Etcher. The Sirus T2 RIE is a basic plasma etching system designed to etch dielectrics and other films that require fluorine-based chemistries. The small footprint and robust design make it ideal fo...
Trion Technology
The Minilock-Phantom III is the first RIE system in the industry to incorporate a vacuum load-lock on a compact platform. The system has been designed to meet all the safety and equipment needs for the most challenging processes including etch applic...
Trion Technology
The Phantom III RIE is designed to supply research and failure analysis laboratories with state-of-the-art plasma etch capability using single wafers, dies or parts using fluorine and oxygen based chemistries. The system has a compact, modular design...
Trion Technology
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