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Home» Optical Manufacturing and Design »

Semiconductor Assembly Equipment

Optical Manufacturing and Design | Semiconductor Assembly Equipment

Matrix 105 Plasma Asher Descum Semiconductor Equipment

Matrix 105 Plasma Asher Descum Equipment for 2 to 4 or 4 to 6 inch waferManufacturer: Matrix Integrated SystemsCondition: Used (Refurbished and warranty is available). Contact Us for more information.Wafer Size Capacity: 2 to 4 inch or 4 to 6 inchMat...

PlasmaEquipments
Semiconductor Plasma Asher Descum Etcher Equipment

We havebeen providing unique technical support, high quality used semiconductor equipment and fast supplied spare parts worldwide.We supply the following refurbished semiconductor plasma descum/asher/stripper,plasma etcher equipment professionally.Co...

PlasmaEquipments
Oracle: Loadlocked RIE/PECVD with Vacuum Cassette Elevator

The Oracle III is the smallest and most flexible full production cluster system on the market. The system consists of a central vacuum transport (CVT), vacuum cassette elevators and up to four process reactors. These process reactors are docked to th...

Trion Technology
Gemini: Multi-Chamber Stripper

The Gemini is the most compact, inexpensive and versatile system, which can handle 100-300mm wafers. This multi-chamber, high throughput stripping system is designed specifically for the demands of today's production fabs. By employing ICP, microwave...

Trion Technology
Titan: Loadlocked RIE or PECVD with Vacuum Cassette Elevator

A very compact, fully automated, vacuum loadlocked plasma system for semi-conductor production. Available in either Reactive Ion Etch (RIE) configuration, High Density Inductive Coupled Plasma (HDICP) or Plasma Enhanced Chemical Vapor Deposition (PEC...

Trion Technology
Apollo Stripper

The cost of new stripping systems has escalated to unreasonable levels. Trion has solved this critical problem. The Apollo is a compact, inexpensive and versatile system, which can handle 100-300mm wafers. By employing either ICP or microwave and RF ...

Trion Technology
Phantom III: Reactive Ion Etch (RIE) System

The Phantom III RIE is designed to supply research and failure analysis laboratories with state-of-the-art plasma etch capability using single wafers, dies or parts using fluorine and oxygen based chemistries. The system has a compact, modular design...

Trion Technology
Orion III: Plasma Enhanced Chemical Vapor Deposition (PECVD) System

The Orion III PECVD system produces production-quality films on a compact platform. The unique reactor design produces low stress films with excellent step coverage at extremely low power levels. The system meets all safety, facility and process requ...

Trion Technology
New AccuThermo AW 810 for 5 to 8 inch wafer Rapid Thermal Process

Allwin21 is the exclusive licensed manufacturerof AG Heatpulse 610Rapid Thermal Processor. Allwin21 is manufacturing the AccuThermo AW 410,AccuThermo AW 610,AccuThermo AW 810,AccuTherm AW 820,AtmosPress Rapid Thermal Processors and AccuThermo AW 610V...

Allwin21 Corp.
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