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Testimonials
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Read full testimonial »Optical Manufacturing and Design | Chemical Vapor Deposition Equipment
The Oracle III is the smallest and most flexible full production cluster system on the market. The system consists of a central vacuum transport (CVT), vacuum cassette elevators and up to four process reactors. These process reactors are docked to th...
Trion Technology
A very compact, fully automated, vacuum loadlocked plasma system for semi-conductor production. Available in either Reactive Ion Etch (RIE) configuration, High Density Inductive Coupled Plasma (HDICP) or Plasma Enhanced Chemical Vapor Deposition (PEC...
Trion Technology
The Orion III PECVD system produces production-quality films on a compact platform. The unique reactor design produces low stress films with excellent step coverage at extremely low power levels. The system meets all safety, facility and process requ...
Trion Technology
The AIXG5 HT Metal Organic Chemical Vapor Phase Deposition system is based on AIXTRON\'s proprietary Planetary Reactor concept. To be used for the deposition of Gallium Nitride materials. The Next Generation Platform AIX G5 HT provides the largest wa...
AIXTRON SE
The CRIUS®II-L reactor is based on the Close Coupled Showerhead® (CCS) concept, which as a key-enabling technology has a well proven track record in being easily scalable with a seamless and short process transfer.The new AIXTRON CRIUS®II...
AIXTRON SE
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