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Chemical Vapor Deposition Plasma Enhanced PECVD

Materials and Chemicals | Chemical Vapor Deposition Plasma Enhanced PECVD

Minilock-Orion III - Plasma Enhanced Chemical Vapor Deposition (PECVD) System with a Vacuum Loadlock

The Minilock-Orion III is a PECVD system with a vacuum loadlock that produces production-quality films on a compact platform. The unique reactor design produces low stress films with excellent step coverage at extremely low power levels. The system m...

Trion Technology
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