Matrix 105 Plasma Asher Descum Semiocnductor Equipment

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Matrix 105 Plasma Asher Descum Semiconductor Equipment

PlasmaEquipments >>

Description

Matrix 105 Plasma Asher Descum Equipment for 2 to 4 or 4 to 6 inch wafer

Manufacturer: Matrix Integrated Systems

Condition: Used (Refurbished and warranty is available). Contact Us for more information.

Wafer Size Capacity: 2 to 4 inch or 4 to 6 inch

Matrix is a Registered Trademark of Matrix Integrated Systems, Inc.Matrix 105 provides high throughput in a single wafer system capable of handling wide variety of substrates, including round, square and ranging from 2¡± up to 6¡±. By maintaining independent closed-loop system controls, the system optimizes vital device parameters.

   1. Single Wafer, Multi-Step Processing
   2. Closed-Loop Temperature Control
   3. Pressure Control
   4. Accurate, closed-loop pressure control with butterfly-style throttle valve and capacitance manometer
   5. RF power: 100 to 500 watts
   6. Timed cycles up to 4 hour each

Product line:	Optical Manufacturing and Design
Subcategories:	Optical Prototypes \| Optics Custom Fabrication \| Ovens \| Photolithography Equipment \| Plasma Cleaning Equipment \| Plasma Etchers \| Plasma Etching High Density \| Rapid Prototyping Systems \| Reflow Ovens \| Rental Equipment Optical Instrument \| Sample Preparation Equipment \| Semiconductor Assembly Equipment \| Slicing and Cutting Machines \| Spectrochemical Equipment \| Sputter Coaters \| Sputtering Equipment \| Stereolithography Equipment \| Surface Profilers \| ThinFilm Deposition Equipment \| Thyratrons \| Tooling and Alignment Systems Optical \| Transducers Semiconductor \| Ultraviolet Instruments \| Used Manufacturing Equipment \| Used optical equipment \| Vacuum Chambers

Product line:

Optical Manufacturing and Design

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